Wigivida Medical
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| Model NO. | CY-ALD | Type | Coating Production Line |
| Coating | Vacuum Coating | Certification | CE |
| Condition | New | Wafer Dimension | 8 Inch and Below |
| Wafer Temperature | Rt-400c, Precision +-0.1c | Precursor Lines | Three Lines (Optional More) |
| Vacuum Level | <5*10-3torr | Carrier Gas | N2 or Ar |
The Thermal Atomic Layer Deposition System is a specialized single-wafer deposition system engineered for scientific research and small-scale industrial experimentation. Compliant with CE criteria, this system is a cornerstone for innovation in micro-electronics, nano-materials, optical films, and solar battery technology.
Key Benefits:
Supported ALD Films:
| Category | Materials |
|---|---|
| Elementary Substances | Co, Cu, Ta, Ti, W, Ge, Pt, Ru, Ni, Fe… |
| Nitrides | TiN, SiN, AlN, TaN, ZrN, HfN, WN … |
| Oxides | TiO2, HfO2, SiO2, ZnO, ZrO2, Al2O3, La2O3, SnO2… |
| Others | GaAs, AlP, InP, GaP, InAs, LaHfxOy, SrTiO3, SrTaO6… |
Application Fields:
| Parameter Item | Specifications |
|---|---|
| Wafer Dimension | 8 inch and below |
| Wafer Temperature | RT-400ºC, Precision ±0.1ºC |
| Number of Precursor | 3 lines (Optional more) |
| Line/Source Temperature | RT-200ºC, Precision ±0.1ºC |
| ALD Valve Type | Swagelok ALD swift valve |
| Background Vacuum | <5*10-3 Torr |
| Growing Mode | Consecutive or interval deposition |
| Controlling System | PLC + Touch screen or Display |
| Power Supply | 50-60Hz, 220V/20A AC |
| Deposition Heterogeneity | <±1% |
| Instrument Dimension | 600mm x 600mm x 1100mm |
