Wigivida Medical
1 / 5
CVD ALD Atomic Layer Deposition System for Powder Coating Plating
The Thermal Atomic Layer Deposition System is a single-wafer deposition system specially designed for scientific research and small-scale experiments of industrialization. The system completely accords with the CE criterion and is widely used in micro-electronics, nano materials, optical films, solar batteries, and more.
Product Benefits:
Advanced software controlling system: Integration of technological formulation, parameter setting, popedom setting, interlocking alarming, and state supervisory control.
Supported ALD Films:
| Wafer Dimension | 8 inch and below |
| Wafer temperature | RT-400ºC, Precision ±0.1ºC |
| Number of precursor | Three precursor lines (optional more) |
| Temperature of precursor lines | RT-200ºC, Precision ±0.1ºC |
| Temperature of source bottles | RT-200ºC, Precision ±0.1ºC |
| ALD Valve | Swagelok ALD swift valve |
| Background vacuum | <5*10-3 Torr |
| Gas carrier system | N2 or Ar |
| Growing mode | Consecutive or interval deposition mode |
| Controlling system | PLC plus touch screen or display |
| Power supply | 50-60Hz, 220V/20A AC |
| Deposition Heterogeneity | <±1% |
| Instrument Dimension | 600mm x 600mm x 1100mm |
