Pilot Vacuum Plating Silver Thin Film Deposition Magnetron Sputtering System

Customization: Available
After-sales Service: Engineers Can Be Sent to The Worksite
Warranty: 1 Year

Product Description

Basic Specifications
TypeCoating Production Line
CoatingVacuum Coating
SubstrateSteel
CertificationCE
ConditionNew
Weight (Kg)4000
Key Selling PointsAutomatic
TechnologyPhysical Vapor Deposition
MethodMagnetron Sputtering
HS Code8543300090
Product Description
Vacuum Plating Silver Thin Film Deposition Magnetron Sputtering System

The equipment is a reasonable structure, coating evenly into good-quality, pumping speed, the cycle of short, high efficiency and easy operation, low energy consumption and performance advantages of stability. Widely used in automotive, audio and various small appliances, computers, clocks and watches, toys, cell phones, reflective Cup, cosmetics, toys and other industries.

Magnetron Sputtering System
Sputtering Equipment Detail
DC & MF Magnetron Sputtering

DC magnetron sputtering coating machine is usually used for direct sputtering coating for different substrates, such as plastic, glass, metal, and ceramic. Magnetic fields define the behavior and properties of the ion-charged particles used for sputtering, enhancing productivity, applicability, and reproducibility.

Coating Process
Vacuum System Interior
Technical Layout

We have dedicated more than 10 years to manufacturing and designing magnetrons that can be rectangular, cylindrical, circular, and of various sizes. They have developed a plethora of targets that can be directly cooled or bonded, and can be manufactured in such a way that can fit most magnetron sizes.

Technical Specifications
Model Number SP-1000 SP-1200 SP-1400 SP-1800
Chamber Dimension (D*H) 1000*1100 1200*1400 1400*1600 1800*2000
Chamber Material Carbon steel, SUS304 or SUS316L
Pumping Time Atmosphere to 5.0*10-2Pa < 8 minutes
Ultimate Vacuum 5.0*10-4 Pa
Working Mode Automatic or Manual mode, by PLC touch screen
Total Power 40-100kW 70-1000kW
System Components & Accessories

Necessary parts available for daily production:

Vacuum pumps
DC sputtering cathode & supplies
Unbalanced sputtering cathode
O rings & Magnetic valves
Vacuum meter & sensors
Bias power supply
Mass Flow Controllers (MFC)
Target materials & Custom jigs
Cathode Components
Vacuum Accessories
Manufacturing Facility
Facility View 1
Facility View 2
Facility View 3
Frequently Asked Questions
Q1: What materials can be coated using this magnetron sputtering system? A: The system is versatile and can apply coatings to various substrates including steel, plastic, glass, metal, and ceramic materials.
Q2: Is the equipment fully automatic? A: Yes, the system features both automatic and manual modes, controlled via a high-resolution PLC touch screen for ease of operation.
Q3: How long does the vacuum pumping process take? A: The system is designed for high efficiency, reaching a vacuum of 5.0*10-2Pa from atmospheric pressure in less than 8 minutes.
Q4: Can the chamber size be customized for specific products? A: Absolutely. All specifications, including the vacuum chamber size, number of sputtering cathodes, and pump configurations, can be customized according to your specific requests.
Q5: What are the primary industries that use this technology? A: It is widely utilized in the automotive, electronics (cell phones, computers), watches, toys, and cosmetics industries for functional and decorative coatings.
Q6: What types of sputtering power sources are supported? A: The system is compatible with various power sources including HiPIMS, DC, MF, and RF to meet different thin-film deposition requirements.

Related Products